![]() ![]() Google Patents Dual damascene process flow for porous low-k materialsÄownload PDF Info Publication number US20050106856A1 US20050106856A1 US10/714,304 US71430403A US2005106856A1 US 20050106856 A1 US20050106856 A1 US 20050106856A1 US 71430403 A US71430403 A US 71430403A US 2005106856 A1 US2005106856 A1 US 2005106856A1 Authority US United States Prior art keywords layer comprised dielectric layer thickness conductive layer Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents US20050106856A1 - Dual damascene process flow for porous low-k materials US20050106856A1 - Dual damascene process flow for porous low-k materials
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